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Paper Details

Growth of metal oxide thin films by Pulsed laser deposition- Perspectives of Pulsed laser ablation mechanism

M. C. Rao

Journal Title:Journal of Chemical, Biological and physical sciences
Abstract


A laser is a device that emits light through a process of optical amplification based on the stimulated emission of photons. Pulsed operation of laser refers to any laser not classified as continuous wave, so that the optical power appears in pulses of some duration at some repetition rate. This encompasses a wide range of technologies addressing a number of different motivations. Pulsed laser deposition is a growth technique in which photonic energy is coupled to the bulk starting material via electronic processes. PLD has normally been done with either solid state or excimer lasers producing milli joule to joule pulse energies with 10 kHz to 10 Hz repetition rates, respectively. Solid state batteries using solid-electrolyte have attractive advantages compared to conventional liquid-electrolyte batteries such as lead-acid batteries or nickel-cadmium cells. PLD is a successful thin film deposition method for the preparation of epitaxial oxide films on different single crystalline substrates. The advantage of PLD is the stoichiometric transfer of complex target materials to the substrate, which can be maintained at a high temperature in a reactive atmosphere. Many new devices may be formed using such high quality single crystalline oxide thin films. This paper deals with the detailed technological aspects of PLD, deposition of different thin films using PLD and the advantages of this method.

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